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Van der Waals metal-semiconductor junction: weak Fermi level pinning enables effective tuning of Schottky barrier

机译:范德瓦尔斯金属 - 半导体结:弱费米能级钉扎   能够有效调节肖特基势垒

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摘要

Two-dimensional (2D) semiconductors have shown great promise in(opto)electronic applications. However, their developments are limited by alarge Schottky barrier (SB) at the metal-semiconductor junction (MSJ), which isdifficult to tune by using conventional metals due to the strong Fermi levelpinning (FLP) effect. Here we show that, this problem can be overcome by using2D metals, which are bounded with 2D semiconductors through van der Waals (vdW)interaction. This success relies on a weak FLP at the vdW MSJ, which isattributed to the suppression of metal-induced gap states. Consequently, the SBbecomes tunable and can vanish with proper 2D metals (e.g. H-NbS2). This worknot only offers new insights into the fundamental properties ofheterojunctions, but also uncovers great potential of 2D metals in deviceapplications.
机译:二维(2D)半导体在(光)电子应用中已显示出广阔的前景。但是,它们的发展受到金属-半导体结(MSJ)处较大的肖特基势垒(SB)的限制,由于强大的费米能级钉扎(FLP)效应,很难使用常规金属进行调谐。在这里,我们表明,可以通过使用2D金属(通过范德华(vdW)相互作用与2D半导体绑定)来克服此问题。这种成功取决于vdW MSJ的FLP弱,这归因于金属诱导的间隙态的抑制。因此,SB变得可调,并且可以使用适当的2D金属(例如H-NbS2)消失。这项工作不仅为异质​​结的基本特性提供了新的见解,而且还发现了二维金属在器件应用中的巨大潜力。

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